Abstract
In this article, we discuss the preparation of indium tin oxide (ITO) by ion beam sputtering and irradiation of the film surface with He and O2 gas with an assist ion gun during deposition. The physical properties of the thin film were examined using the van der Pauw, SEM, and X-ray diffraction techniques. The influence of the assist ion gun on the ITO film was studied and adjusted to improve the reflectivity of the film. Details on the optical and electrical properties of the ITO film and structural changes that occurred are presented. ©1999 Scripta Technica, Electron Comm Jpn Pt 2, 82(5): 30–35, 1999
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