Low-loss optical fibers prepared by plasma-activated chemical vapor deposition (CVD)

Abstract

A modified method for the preparation of low-loss optical fibers by means of chemical vapor deposition (CVD) techniques has been developed. In this method, a nonisothermal plasma is used to stimulate the reactions. Deposition of oxides then occurs only heterogeneously on the substrate. Results obtained by this method show optical losses well below 10 dB/km—having a minimum of 1.4 dB/km at a wavelength of 1050 nm—and a pulse dispersion of 0.8 ns/km.