Low-field electron emission of Si micro-tip arrays produced by laser beam evaporation

Abstract

Low threshold field electron emission is reported of the periodical array of Si micro-tips produced by laser-assisted evaporation of a Si wafer in vacuum. Laser ablation of solids at sufficiently high fluence and number of laser pulses results in formation of the specific surface morphology. Namely, the surface is covered by a periodical array of micro-columns that protrude above the initial surface of the wafer for 10-20 /spl mu/m. Typical SEM view of such a surface is presented in this paper.