Abstract
ABSTRACTCarbon films with variable sp3/sp2 bonding ratio can be deposited on a variety of substrates at room temperature, using the cathodic vacuum arc deposition process. The variation in their surface morphology as a function of He and N2partial pressure during growth have been investigated and it has been shown that the morphology of the films can be varied from the mirror like smooth tetrahedrally bonded carbon (ta-C) films through nanocluster to fibrous type carbon. This paper reviews the work carried out on Field Emission from these various carbon films. Threshold fields as low as 1 V/μm for emission current densities of 1 μA/cm2 and emission site densities of up to 104 -105/cm2 have been obtained.
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