Abstract
Carbon films with variable sp 3/sp 2 bonding ratio can be deposited on a variety of substrates at room temperature, using the cathodic vacuum arc deposition process. The variation in their surface morphology as a function of He and N 2 partial pressure during growth have been investigated and it has been shown that the morphology of the films can be varied from the mirror-like smooth tetrahedrally bonded amorphous carbon (ta-C) films through nanocluster to fibrous-type carbon. This paper reviews the work carried out on Field Emission from these various carbon films. Threshold fields as low as 1 V/μm for emission current densities of 1 μA/cm 2 and emission site densities of up to 10 4–10 5/cm 2 have been obtained.
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