Abstract
Vanadium oxide thin films (VO2 Monoclinic (M) or V2O5) on silica glass substrates were prepared by Metal-Organic Deposition (MOD) using Infra-Red furnace (Thermal-MOD) and Excimer Laser Assisted Metal-Organic Deposition (ELAMOD). On one hand, using thermal process (i.e. Infra-Red furnace sintering) for 90 min at 300 °C in air and O2 atmosphere, V2O5 was formed and in N2 atmosphere at 500 °C for 90 min, VO2 (M) was formed. On the other hand, VO2 (M) was obtained with laser (ELAMOD) sintering at 300 °C, with no specific atmosphere control (ambient air), for only 1 min and without any resort to a buffer layer to achieve homogeneous coverage. Formation mechanism of the VO2 (M) with thermal MOD process and UV laser process is discussed.
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