Low-temperature process design for inversion mode n-channel thin-film-transistor on polycrystalline Ge formed by solid-phase crystallization

Abstract

We fabricated an inversion mode n-channel thin-film-transistor (TFT) on polycrystalline (poly-) Ge at low temperatures for monolithic three-dimensional large-scale IC (3D-LSI) and flexible electronics applications. Based on our previously reported solid-phase crystallization (SPC) method, we designed an n-channel TFT fabrication process with phosphorous ion implantation to provide the source/drain (S/D). We succeeded in fabricating an n-channel TFT with typical electrical characteristics on poly-Ge and confirmed its operation mode to be inversion mode. However, the fabrication process included a high temperature (500 °C) step for S/D activation. To reduce the process temperature, we used a metal-induced dopant activation method and successfully reduced the activation temperature to 360 °C. This combination is expected to pave the way for high-performance 3D-LSI and flexible electronic devices based on SPC-Ge.