Low Temperature Preparation of KNbO3Films by Hydrothermal Method and Their Characterization

Abstract

ABSTRACTKNbO3films were prepared at 100 - 240°C on (100)cSrRuO3//(100)SrTiO3substrates by hydrothermal method using KOH and Nb2O5as source materials. The incubation time before starting deposition and the deposition rate after starting deposition increased and decreased with decreasing deposition temperature, respectively. Epitaxial {100}c-oriented KNbO3films with 300 nm thick were successfully obtained at 100°C on (100)cSrRuO3//(100)SrTiO3substrates for 144 h. We observed the typical butterfly-shape strain curves originated from the piezoelectricity for the first time for KNbO3films deposited down to 120°C.