Low temperature growth of diamond-like nanocomposite films prepared by PACVD from Ar diluted siloxane plasma

Abstract

Here, the diamond-like films in composite of nanostructure form are grown at low temperature (∼100 °C) from siloxane precursor incorporating silicon oxide (SiOx) moiety in amorphous carbon hydrogen (a-C:H) network using radio frequency plasma assisted chemical vapour deposition (rf-PACVD) method on various substances including ultra high molecular weight polyethylene (UHMWPE) substrates with the change in argon (Ar) carrier gas flow rate. The deposited diamond-like nanocomposite (DLN) films have been characterized using different spectroscopic techniques and tribological tests to understand the optimum deposition condition. The biocompatible nature of superior DLN film makes it a promising articulate knee and hip joint coating material.