Low temperature growth of carbon nanotubes in a magnetic field

Abstract

We report on the growth of carbon nanotubes on a glass substrate at a low temperature of 450 °C by plasma-enhanced chemical vapor deposition in the presence of a magnetic field. The growth of carbon nanotubes can be realized at 450 °C only when a magnetic field is applied to the substrate. Carbon nanotubes cannot be grown in the absence of a magnetic field at the same temperature. An NH 3 plasma pretreatment significantly improved the uniformity of the grain size of the Ni catalyst under the magnetic field. The enhancement in the growth of CNTs at low temperature can be attributed to the magnetic moment pre-alignment of the ferromagnetic catalyst film under high magnetic field. A high emission current density of 20 mA/cm 2 was obtained at 6 V/μm and a stable emission current was observed. This method permits the growth of carbon nanotubes directly on glass substrate at much more reliable low temperatures for the fabrication of high-density field emitter arrays.