Low-resistivity ITO films by dc arc discharge ion plating for high duty LCDs

Abstract

Low-resistivity, highly transparent indium tin oxide (ITO) films were prepared on glass and color filter substrates at substrate temperatures below 200°C, using the dc arc discharge ion plating (ADIP) technique. A resistivity of 1.07 × 10 −4 Ω cm was achieved with ITO films formed on glass and a resistivity of 1.20 × 10 −4 Ω cm was achieved on color filters at a substrate temperature of 200°C. The experiments were done using an in-line type vacuum coating system. We established production techniques suitable for mass production, with sheet resistance below 5 Ω/cm 2, and with a material erosion efficiency greater than 90%.