Abstract

We present low-temperature measurements of low-loss superconducting nanowire-embedded resonators in the low-power limit relevant for quantum circuits. The superconducting resonators are embedded with superconducting nanowires with widths down to 20nm using a neon focused ion beam. In the low-power limit, we demonstrate an internal quality factor up to 3.9x10^5 at 300mK [implying a two-level-system-limited quality factor up to 2x10^5 at 10 mK], not only significantly higher than in similar devices but also matching the state of the art of conventional Josephson-junction-embedded resonators. We also show a high sensitivity of the nanowire to stray infrared photons, which is controllable by suitable precautions to minimize stray photons in the sample environment. Our results suggest that there are excellent prospects for superconducting-nanowire-based quantum circuits.

Highlights

  • Quantum circuits based on conventional Josephson junctions have begun to tackle real-world problems [1]

  • This has been despite high decoherence produced by the loss [2,3] and noise [4,5] caused by parasitic two-level systems (TLSs) [6,7]

  • Where ν is the applied frequency, ν0 the resonance frequency, QL the loaded quality factor, and jQcj the absolute value of the coupling quality factor. φ accounts for impedance mismatches, a describes a change in amplitude, θ describes a change in phase, and τ a change in the electronic delay

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Summary

Introduction

Quantum circuits based on conventional Josephson junctions have begun to tackle real-world problems [1]. This has been despite high decoherence produced by the loss [2,3] and noise [4,5] caused by parasitic two-level systems (TLSs) [6,7]. Previous demonstrations of superconducting nanowire-embedded resonators exhibit unusually high dissipation, with internal quality factors (Qi) below 5 × 103 [10,11,12,15], far lower than in similar conventional Josephson-junction-based circuits [16,17]. The performance of nanowire-embedded resonators can be limited by material quality, interface imperfections, resist residues, and the measurement environment

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