Abstract

We demonstrate a low-loss coupling scheme between a silicon photonic waveguide and a hybrid-plasmonic waveguide. Measured coupling efficiencies reach up to 94% or -0.27 dB. The metal-insulator-semiconductor structure is fabrication-tolerant and adaptable to a wide range of materials including those used in CMOS processes. The coupler is a promising building block for low-loss active plasmonic devices.

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