Abstract
We have designed and manufactured a new prototype low energy ion source, which allows one to perform ion beam assisted deposition (IBAD), ionic cleaning, and sputter etching processes, with a single source. This ion source consists of a magnetron sputtering source followed by a lens system to extract and accelerate the ions; the design can be adapted both to small laboratory equipment, and to large area systems. By virtue of the special design of the cathode, the target can be in powder or liquid form. This source has therefore been called the universal cold cathode ion source (UCCIS), and its low energy prototype (LE-UCCIS) has been manufactured and tested; the relevant results are reported in this paper. Moreover a number of simulations according to a special computer code have been carried out to assess the best energy and dose regimes to be applied when etching, when using ionic cleaning and for IBAD.
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