Abstract

Monoclinic gallium oxide (β-Ga2O3) is attracting intense focus as a material for power electronics, thanks to its ultra-wide bandgap (4.5–4.8 eV) and ability to be easily doped n-type. Because the holes self-trap, the band-edge luminescence is weak; hence, β-Ga2O3 has not been regarded as a promising material for light emission. In this work, optical and structural imaging methods revealed the presence of localized surface defects that emit in the near-UV (3.27 eV, 380 nm) when excited by sub-bandgap light. The PL emission of these centers is extremely bright—50 times brighter than that of single-crystal ZnO, a direct-gap semiconductor that has been touted as an active material for UV devices.

Highlights

  • Monoclinic gallium oxide (β-Ga2O3) is attracting intense focus as a material for power electronics, thanks to its ultra-wide bandgap (4.5–4.8 eV) and ability to be doped n-type

  • We report PL emission correlated with surface pits in hydrogenated G­ a2O3

  • X-ray diffraction (XRD) measurements of the as-grown and hydrogenated samples showed that the crystals are oriented in the (010) direction and the of degree crystallinity improved after hydrogen annealing (Supplementary Fig. S1)

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Summary

Introduction

Monoclinic gallium oxide (β-Ga2O3) is attracting intense focus as a material for power electronics, thanks to its ultra-wide bandgap (4.5–4.8 eV) and ability to be doped n-type. Annealing ­Ga2O3 in hydrogen is a potential method to passivate defects and improve material quality. We report PL emission correlated with surface pits in hydrogenated G­ a2O3. X-ray diffraction (XRD) measurements of the as-grown and hydrogenated samples showed that the crystals are oriented in the (010) direction and the of degree crystallinity improved after hydrogen annealing (Supplementary Fig. S1).

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