Abstract
Local nature of gate hysteresis in a carbon nanotube field-effect transistor (CNFET) was studied using scanning gate microscopy (SGM). A sequential set of SGM images of the CNFET fabricated on a SiO 2/Si substrate was obtained at a low temperature under an ultra-high vacuum. Comparisons of the SGM images obtained at decreasing and increasing gate voltage steps revealed that the order of appearance of SGM defects could not be accounted for by a uniform distribution of hysteretic gate screening along the carbon nanotube (CNT) channel. It was concluded that the gate hysteresis in the CNFET had substantial local variations along the CNT. The local inhomogeneity in gate hysteresis was attributed to inhomogeneous distribution of screening charge traps or sources on the SiO 2 surface.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
