Abstract

Formation of the oxide nanostructures by the local anodic oxidation of textured polycrystalline Ni(111) and Ni(200) films was investigated. It was shown that the local anodic oxidation is significantly affected by the texture of the Ni film: threshold process voltage and time required for the local anodic oxidation initiation is higher for (111) texture than for (200) texture; at the same process parameters (oxidation time, voltage, etc.) the oxide nanostructures formed on the Ni(200) are bigger than for Ni(111).

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