Abstract
Microchannel plates（MCPs）are the key component of the image intensifier. Compared with the traditional MCPs, the Si MCPs which are fabricated by micro-nanofabrication technologies have a high gain, low noise and high resolution etc. In this paper, the lithography process is studied in the process of fabricating periodic micropore array with 10 um pores and 5 um pitch on Si. The effects of exposure time, reversal bake temperature and development time on the lithography quality are focused. By doing a series of experiments the better result is got: the photoresist film is obtained at a low speed 500/15(rpm/s) and a high speed 4500/50(rpm/s); the soft bake time is 10min at 100℃; the exposure time is 10s; the reversal bake time is 80s at 115℃; the development time is 55s. By microscope observation and measurement, the pattern is complete and the size of the pattern is accure, it meets the requirement of lithography process for fabricating Si-MCP.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
