Abstract
Molybdenum trioxide films have been prepared by RF-sputtering using an oxygen-argon mixture containing sputter gas and a molybdenum target. Samples were deposited at different oxygen flow rates in the range from 1.5 to 8 cm3/min onto ITO-covered thick glass plate or nickel foil substrates. Lithium intercalation of RF-sputtered films has been tested in Li/1M LiClO4-PC-PMMA/MoO3 galvanic cells. We report the electrochemical properties of various lithium-intercalated MoO3 films. Influence of both the growth conditions and the nature of the film substrate have been investigated on the discharge behavior of cells and on the kinetics of intercalation.
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