Abstract
The liquid-phase epitaxial growth of Pb1−xSnx Te on PbTe (100) substrates has been investigated over a range of growth temperatures from 600-400°C, and has been found to produce material with good uniformity and reproducibility of carrier concen-tration and alloy composition. The assessment of the epitaxial layers by such techniques as x-ray diffraction, dislocation etching and thermo-electric power measurements is described. Various features of the epitaxial layers such as interface irregularity, dislocation and diffusion effects are discussed, and likely mechanisms for their existence are proposed. The hole concentrations of the epitaxial layers, obtained by thermoelectric power measurements, are shown to have a similar dependence on preparation temperature as for bulk annealed material, suggesting that native defects are the dominant source of carriers above~ 2×10* cm-3.
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