Liquid Phase Deposition of Amorphous Carbon and Carbon Nitride Films

Abstract

Liquid phase deposition of amorphous carbon (a-C) and carbon nitride (CNx) film has been attempted by means of electrolysis of organic liquids. The deposition of a-C film is achieved by applying a DC bias voltage to substrate immersed in methanol. Smooth and homogeneous a-C films are deposited on specific substrate materials such as Si, Ti, and Al. The deposition of CNx films are carried out by using nitrogen-containing electrolyte such as acrylonitrile (CH2CHCN). Continuous and uniform films are obtained with the application of both negative and positive bias voltages. The atomic ratios of nitrogen to carbon in the grown films are estimated as 0.16–0.28. Those results demonstrate the feasibility of using liquid deposition techniques for the production of carbon related materials. [DOI: 10.1380/ejssnt.2009.102]