Abstract
Linear (refractive index) and non-linear (second order non-linear optical susceptibility) gratings are of primary interest in optoelectronics. While linear gratings may be used for filtering or wave length selective coupling, non-linear gratings may find applications in active devices such as second harmonic generators, parametric generators or all optical switches through cascading of second order susceptibilities. We report on a simple method for the inscription of linear or non-linear gratings in DR1 side chain polymer thin films or waveguides. The technique is based on the photoisomerisation induced reorientation properties of such a material under irradiation with an argon ion laser. It avoids the use of interdigited electrodes for the selective orientation of the dyes, can be easily applied to a waveguide geometry and results into a good orientational stability. Sample characterization involves polarized microscopy and second harmonic generation.
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