Abstract
The implementation of a “superjunction” collector design in a silicon–germanium heterojunction bipolar transistor technology is explored for enhancing breakdown performance. The superjunction collector is formed via the placement of a series of alternating the p/xn-doped layers in the collector-base space charge region and is used to reduce avalanche generation leading to breakdown. An overview of the physics underlying superjunction collector operation is presented, together with TCAD simulations, and a parameterization methodology is developed to explore the limits of the superjunction collector performance. Measured data demonstrate the limitations explored in simulation.
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