Abstract
In this paper, we simulate the electrical characteristics of the n-type metal-oxide-semiconductor (NMOS) transistor in a 65-nm complementary metal-oxide-semiconductor (CMOS) inverter under the actions of heavy ions with different linear energy transfers (LET). We analyze the influence of incident ions with different LETs on a device using technology computer-aided design (TCAD) software, and aim to establish an HSPICE sub-circuit model containing the relationship between the electrical properties of a device and the LET of an incident ion for circuit-level HSPICE simulation. Based on the SEE funnel mechanism, we propose an analytical model to describe the relationship between the charge collected by the NMOS drain and the LET of the incident ion, and build an HSPICE model based on this analytical model. With such a model, the influence of incident ions with different circuit-level LETs can be determined from HSPICE simulation. In addition, good agreement with simulation results is reached, proving the reasonableness of the proposed model.
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