Abstract
The investigation on the lattice relaxation of FePt/TiN heteroepitaxial film was conducted by means of the thickness-dependent evolution of microstructure and magnetic properties. The critical thickness of FePt epitaxial growth on TiN was determined to be around 10 nm based on the lattice constant simulation according to equilibrium theory, which was consistent with the experimental value obtained from cross-sectional transmission electron microscope (TEM) measurements. Using high-resolution TEM images, the lattice relaxation mechanism of the FePt layer was clearly explained via the formation of edge dislocations at the critical thickness and the ensuing tilt of {1 1 1} lattice planes towards the film normal direction. It is found that the lattice relaxation caused the misorientation of the easy axes, and therefore in-plane magnetization increased and perpendicular anisotropy deteriorated with FePt thickness increasing from 10 to 40 nm.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
