Abstract
We have measured the absorption coefficient at λ=850 nm for an amorphous Si (a-Si:H) p-i-n photodiode laterally coupled to a silicon-oxinitride single mode planar waveguide both for TE and TM modes. The experimental results are compared to calculations considering a five-layer system with a complex index of refraction for the absorbing layer. Theoretical and experimental results agree well considering the inaccuracies in the determination of the layer thicknesses.
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