Abstract
AbstractThis article reviews the characteristics of gas lasers that are chiefly responsible for their effectiveness as both scientific and industrial tool. The basic principles common to operation of all gas lasers and a few of their general properties are discussed. The lasers are categorized according to the pumping mechanisms: electron‐impact excitation (copper and gold laser, Ar‐ and Kr‐ion lasers), excitation transfer (He–Ne laser, He–Cd laser, CO2laser), reactive collision lasers (excimer laser (ArF, KrF, XeCl, XeF, F2), chemical lasers (HF, COIL)), and other lasers in the far infrared, ultraviolet, and soft X‐ray region. Selected applications of pulsed and continuous gas lasers are presented in material processing, marking and laser evaporation, microlithography, photochemical processing, stereolithography, and medicine.
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