Laser-induced chemical vapor deposition of metals for microelectronics technology

Abstract

Laser-induced chemical vapor deposition of high-purity metals has been applied to a wide variety of microelectronics applications. The ability to selectively produce thin metallic films with good electrical properties, in a well defined and controlled manner, has been a major goal of research in this area. An understanding of the laser deposition process, such as the laser-surface interaction and the decomposition chemistry of the metal precursor, is critical. In recent years, a greater understanding of the fundamental processes has been gained and great progress has been made in the design and optimization of precursors for the deposition of high-purity metals. The ability to deposit conducting metals has enabled specific applications to be addressed. The most promising applications are the laser-induced repair of “open” circuit defects, laser-induced deposition of interconnects for customization of circuits and the repair of “clear” defects in lithographic masks. Further, using laser-induced deposition for the testing of early engineering designs and the customization of limited-volume microelectronic components may provide a cost-effective alternative to conventional lithographic processes.