Abstract
A good transparent conductive and a high purity films of the Hafnium Di-Oxide (HfO2) micro and the nano structure were successfully deposited on the Quartz substrates. Pulsed Laser Deposition (PLD) method was employed; effect of laser wave length was studied. The XRD result shows a two appeared phases, the cubic hafnium dioxide and monoclinic, the main oriented peak found to be cubic at (1 1 1) diffraction plane. The optical properties results show a good transparency reached to about (91%). The band gap values of the deposited Nano HfO2 films are increases as laser wavelength decrease and its values around from 5.18 to 5.62 eV, The AFM results shows increasing average grain diameter values from (62.31–77.53) nm.
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