Laser scribing of thin film solar cells

Abstract

Laser scribing of thin film solar cells for TCO, absorber and top contact layers with nanosecond laser is described in this paper. P1 process (TCO scribing) is performed with 355nm and 1064nm lasers; P2 (absorber) and P3 (top contact) patterning with 532 nm laser are conducted. All the scribing processes are performed on laser systems developed by Suzhou Delphi Laser. All the scribing processes are optimized for production with different parameters such as pulse width, repetition rate, power etc. It is found that the dusting system and beam path design are very important to the optimization of the processes. Experiments on edge isolation with 1064nm laser and different pulse width are also performed. Finally, laser scribing process is applied to BIPV thin film solar cells with large spot size (>250um) and different beam shapes (circular and square) ar ediscussedLaser scribing of thin film solar cells for TCO, absorber and top contact layers with nanosecond laser is described in this paper. P1 process (TCO scribing) is performed with 355nm and 1064nm lasers; P2 (absorber) and P3 (top contact) patterning with 532 nm laser are conducted. All the scribing processes are performed on laser systems developed by Suzhou Delphi Laser. All the scribing processes are optimized for production with different parameters such as pulse width, repetition rate, power etc. It is found that the dusting system and beam path design are very important to the optimization of the processes. Experiments on edge isolation with 1064nm laser and different pulse width are also performed. Finally, laser scribing process is applied to BIPV thin film solar cells with large spot size (>250um) and different beam shapes (circular and square) ar ediscussed