Abstract
Pulsed laser deposition as a method of physical vapour deposition suitable for the deposition of thin films with complex structures and compositions is briefly reviewed. Excimer, Nd:YAG and CO 2 laser radiation are comparatively investigated as a function of laser parameters and processing variables in order to deposit thin ceramic (Al 2O 3, ZrO 2, SiC, BN, BaTiO 3, Y 1Ba 2Cu 3O 7-) films on various substrates (stainless steel, hard metal, Si, ZrO 2, SrTiO 3). The methods of generating multicomponent and multilayer thin films, including the advantages of pulsed laser deposition, are described, indicating the great future application potential of pulsed laser deposition as a versatile and flexible method for the generation of films with complex compositions and structures. The laser parameters and processing variables achieve different vapour and/or plasma states, represented in the number, momentum and energy of the ensemble of species generated, which are used to deposit thin films with defined properties according to the application, in view of the mechanical-technical properties, tribological properties, fatigue and thermal barrier, illustrated by examples.
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