Abstract
The nanoablation (cold laser-induced etching) of a diamond surface has been experimentally investigated at different ambient air pressures ranging from atmospheric to high vacuum (10-7 Torr). The exposure of a diamond monocrystal sample was performed by using the second harmonic (λ=400 nm) of a Ti-sapphire laser (τ=120 fs). The pressure dependence of the surface etching rate was obtained and corroborates a model that regards nanoablation as a result of multiphoton photochemical oxidation of the diamond. The features of the diamond oxidation at various environmental pressures are discussed as well as the effect of a surface water layer on the etching rate of the diamond.
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