Laser-induced damage characteristic of porous alumina optical films

Abstract

Pure aluminum films were deposited on B270 glass by electron beam evaporation technique. The aluminum films, which were used as anode, were placed in phosphoric acid to prepare porous alumina films using a two-step anodization method. They were subsequently annealed in high temperature to improve transmission. The microstructure, transmitted spectrum and laser damage characteristics of the alumina films were then tested. Their microstructure formed in phosphoric acid was retiform. The transmissivity can be increased efficiently if the annealing temperature is adequately high. The laser-damaged spots of the porous films were formed by innumerable small damaged pits with no mutual effect. In contrast, the laser-damaged spots of the compact films were formed by several larger damaged pits which acted together toward expansion. The damage process of the porous films comprised heat ablation and stress fracture.