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https://doi.org/10.1364/oic.2007.fb3
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Cite Publication Date: Jan 1, 2007 |
Affiliation: Centrale Marseille, Institut Fresnel
We study the laser damage resistance at 1064 and 355nm of HfO2 thin films deposited by three different processes in various conditions. We compare their Laser Induced Damage Threshold obtained trough several measurement procedures.
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