Abstract
Abstract Pulsed laser irradiation combined with scanning probe microscopy (SPM) to achieve surface nanopatterning is investigated. A nanosecond pulsed laser beam is introduced to a gap between SPM tip and substrate surface. With the tip scanning over the surface, 10 nm resolution nanolines and nanocharacters can be obtained on metal and photoresist surfaces. With the fine-tuning of laser processing parameters, the depth and width of the nanolines can be controlled. Laser surface nanopatterning is also carried out by optical near-field effect with particles as lithography mask. Theory study shows that small particles work as efficient lenses. Light intensity under the particles is greatly enhanced dozens of times within a region
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