Abstract
AbstractWe have investigated the growth of carbon nitride (CNx) coatings on various substrates using laser assisted methods such as pulsed laser deposition (PLD) and laser chemical vapor deposition (LCVD). It has been shown that the both techniques produce good quality thin films of CNx. In PLD, a laser beam (λ= 248 nm) has been used to ablate the pyrolytic graphite target in nitrogen atmosphere, where as CO2 laser was used to irradiate carbon-nitrogen containing mixtures such as C2H2/N20/NH3 in LCVD method. A comparative analysis will be presented in terms of structural properties of CNx films prepared by both techniques.
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