Abstract

Interface roughness and local electronic states formed in GaAs quantum wells (QWs) grown on (110) cleaved surfaces were characterized by high-resolution microscopic photoluminescence (micro-PL) imaging and spectroscopy assisted by a solid immersion lens. From macroscopic PL spectra and micro-PL images, it was found that well width fluctuation of about 0.6 to 0.7 nm, which corresponds to 3 to 3.5 monolayers (ML), with laterally sub-$\ensuremath{\mu}\mathrm{m}$- to $\ensuremath{\mu}\mathrm{m}$-scale ML terraces existed in the (110) GaAs/AlAs QWs, and this was also supported by the results of atomic force microscopy measurements performed on the (110) GaAs surface. In high-resolution solid-immersion micro-PL spectroscopy, sharp PL peaks were observed at low excitation power and their temperature and excitation power dependence showed a localized quantum-dot-like (QD-like) nature in the (110) GaAs QWs. The spatial and spectral distribution of these sharp PL peaks indicated that the localized QD-like states were formed by short-scale roughness in the bottom GaAs-on-AlAs interface of the (110) GaAs/AlAs QWs on each $\ensuremath{\mu}\mathrm{m}$-scale large ML terrace in the top AlAs-on-GaAs interface.

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