Abstract
The development of a reactive dc diode sputtering system for the deposition of indium oxide coatings by scanning large substrates will be described. Coatings of 5 Ω/sq, with 86% light transmission, having a specific resistivity of less than 2.5×10−4Ω cm are routinely produced on curved and flat substrates up to 5 ft2. Effects particularly noticeable in large sputtering systems, such as secondary electron emission, plasma focusing, imperfections due to cathode nonuniformity, arcing caused by cathode contamination, and substrate temperature gradients, will be emphasized.
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