Abstract
A large-diameter and uniform SF6 (sulfur hexafluoride) plasma is produced by a plane slotted antenna with permanent magnets for electron cyclotron resonance. The plasma is fairly homogeneous similarly to the case of an argon plasma, and the uniformity is within ±3% for a diameter of ∼20 cm at a distance of 20 cm from the antenna. Similar uniformity is obtained in the etching process of polysilicon. The etching rate is enhanced by the assistance of ion acceleration using the RF self-bias technique.
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