Large area lateral overgrowth of mismatched InGaP on GaAs(111)B substrates

Abstract

AbstractApplication of InGaAs/InGaP double‐heterostructure (DH) lasers increases the band offset between the cladding layer and the active layer more than the use of conventional 1.3 µm InGaAsP/InP lasers. As a first step in realizing 1.3 µm InGaP/InGaAs/InGaP DH lasers, we proposed InGaP lattice‐mismatched epitaxial lateral overgrowth (ELO) technique and successfully carried out the InGaP growth on both GaAs (100), (111)B and InP (100) substrates by liquid phase epitaxy. In this work, we grew the InGaP crystal on GaAs (111)B substrate by adjusting Ga and P composition in In solution, to obtain In0.79Ga0.21P (λ = 820 nm) virtual substrate for 1.3 µm InGaAs/InGaP DH lasers. To grow the InGaP all over the lateral surface of the substrate, the growth time was extended to 6 hours. The amount of InGaP lateral growth up to 2 hours was gradually increased, but the lateral growth was saturated. The InGaP lateral width was about 250 µm at the growth time of 6 hours. We report the result that optical microscope observation, CL and X‐ray rocking curve measurements and reciprocal lattice space mapping were carried out to evaluate the crystal quality of the grown InGaP layers. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)