Abstract
Lanthanum chromium oxide (LaCrO3) has the excellent high temperature properties. LaCrO3 doped alkaline earth metal also has the high electric conductivity. The purpose of this study is to fabricate thin film heaters using LaCrO3 doped Ca by RF magnetron sputtering method. Crystal structure of thin films was evaluated and a surface form was studied. Results show that thin films deposited on Si(100) single crystal and quartz glass substrate in Ar gas had strong orientation and its surface form was comparatively smooth. Crystal structure of the thin film deposited on Si(100) and quartz glass substrate at temperature 700°C and 800°C by sputtering in mixture of Ar and O2 gases was the same as the crystal structure of LaCrO3. Heating characteristic of a thin film heater on Si(100) substrate with Pt electrodes was evaluated by the measurements of equilibrium temperature-current (T-I) and resistance-equilibrium temperature (R-T) characteristics. The maximum equilibrium heating temperature was about 1100°C.
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