Abstract
The kinetics and thermodynamics of hydrogen adsorption on thin cobalt films at 195, 273 and 298 K have been studied by means of sticking probability measurements, thermal desorption mass spectrometry (TDMS) and examination of adsorption isotherms. The dissociative adsorption occurs with a high initial sticking coefficient ( S 0 close to unity) at all temperatures. The behaviour of the sticking probability S as a function of hydrogen coverage θ has been analyzed. Two TDMS peaks were detected when hydrogen adsorption was carried out at 195 K. The isosteric heat of adsorption remains constant at 286 K up to θ ≈ 0.5 and then decreases indicating the arising of a new adsorbed state of hydrogen at θ > 0.5. A detailed analysis of the adsorption entropy for T ≈ 286 K has been performed.
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