Abstract
The kinetics of CH 2 O oxidation has been studied in the interval of 500–700°C in quartz reactors with a packing treated with boric acid, potassium tetraborate, potassium chloride, and potassium bromide. It has been established that in reactors treated by the reaction or by boric acid, oxidation proceeds autocatalitically with the formation of hydrogen peroxide. In reactors, the surfaces of which have been coated by other substances, oxidation proceeds till formaldehyde burns down to considerable depths with a constant rate and intermediate products are absent. The use of the new principle for the study of slow gas reactions allowed the discovery of great concentrations of HO 2 radicals in the reaction products in uncoated or boric acid vessels, and to measure the kinetics of their accumulation at various temperatures together with the kinetics of H 2 O 2 accumulation and CH 2 O consumption. In reactors coated with KBr radicals have not been obtained. In reactors coated by K 2 B 4 O 7 traces of hydrogen peroxide and slight quantities of HO 2 radicals have been obtained. A probable mechanism of CH 2 O oxidation in reactors coated with boric acid has been discussed.
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