Abstract

A Java program in a GUI environment has been developed for the numerical solution of basic partial differential equations and applied to Au diffusion in Si affected by vacancies and self-interstitials. Text fields of selected parameters for the calculation are set on the display, and the calculation starts by checking the start button after putting values on the text fields. The calculated results are plotted immediately after the finish of the calculation as the concentration profiles of substitutional Au, interstitial Au, vacancies and self-interstitials, and their diffusion can be presented immediately, resulting in the identification of the diffusion mechanism. By changing the values of the text fields, new results can be represented immediately. The diffusion of Au in Si can be simulated correctly and easily by this program. Results from the program for one set of conditions are shown, including images produced on the display.

Highlights

  • Au atoms in Si occupy interstitial and substitutional sites, and the substitutional Au exists in three states depending on the heat treatment history [1]: high-temperature substitutional Au, low-temperature substitutional Au, and agglomerations of substitutional Au

  • A Java program in a GUI environment has been developed for the numerical solution of basic partial differential equations and applied to Au diffusion in Si affected by vacancies and self-interstitials

  • Text fields of selected parameters for the calculation are set on the display, and the calculation starts by checking the start button after putting values on the text fields

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Summary

Introduction

Au atoms in Si occupy interstitial and substitutional sites, and the substitutional Au exists in three states depending on the heat treatment history [1]: high-temperature substitutional Au, low-temperature substitutional Au, and agglomerations of substitutional Au. The author has previously investigated Au diffusion using Java programming by obtaining a numerical solution to a single partial differential equation obtained from the above four differential equations under several approximations. This approach was adopted because of the difficulty of directly numerically solving the above four partial differential equations due to the limitation in the capacity of personal computers [7]. Recently the capacity of personal computers has been progressing rapidly, and the author has been able to directly solve the four partial differential equations involved in Au diffusion by Java programming. The diffusion of Au in Si can be simulated correctly and using Java in a GUI (Graphical User Interface) environment

Ni x2
Crank-Nicolson’s Implicit Method and Gauss-Seidel’s Iteration Method
Constants
Selection of Parameters
Boundary and Initial Conditions
Java Simulation
Discussion and Results

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