Abstract
Photoresist stripping process in photo lithography plays an important role in manufacturing large-scale integration. In the present study, experimental information is obtained to establish high concentrated ozone water technology, in stead of chemicals such as sulfuric acid or hydrochloric acid. We examine flow structure between a stationary and a rotating disk for the sake of improving removal rate of photoresist using flow structure between the disks. Three-components velocities which are a radial, rotational and z directional flow velocity in a plane are obtained with stereo micro PTV measurement of a flow in the narrow gap. It is confirmed that z directional flow exits near the edge of the disk.
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