Abstract
We studied isotope effects on D and H coadsorptions on the Si(100) and Si(111) surfaces, employing an atomic beam method combined with a desorption measurement technique. We evaluated D:H ratios to be approximately 6:4 for both the Si(100) and Si(111) surfaces exposed to the atomic H/D beam mixed with equal amounts of H and D atoms. This observed isotope effect was interpreted in terms of mass-dependent abstraction of surface adatoms by incident atoms. The observed D:H ratios could be well reproduced by the simulation based on the previously reported isotope effect on D(H) abstraction by H atoms.
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