Abstract
Lithium hydride thin films were deposited by pulsed laser deposition and structurally characterized by means of IR spectra. The pressure of H2 used as a reactive gas was changed and the substrate temperature, substrate- target distance, laser fluence, and other conditions were defined. The research result shows that the pressure of H2 is an important factor that affects the quality of lithium hydride films. With increase in hydrogen gas pressure, the H2 content in the films rises and peak maxima of the Li–H bond move to higher wave numbers.
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