Ion source development for various applications in Korea (invited) (abstract)

Abstract

Ion source development in Korea has been related with various applications from accelerator to nanotechnology. Conventional ion sources such as Duoplasmatron and PIG ion sources were developed for high power proton accelerator and small cyclotron accelerators. To improve lifetime of the high current proton ion source, helicon plasma ion sources were developed with external rf antenna and applied for neutron generation in drive-in-target configuration. Negative hydrogen ion sources were also developed for tandem and cyclotron accelerators by using both rf and filament discharges. Large-area high-current ion sources for the KSTAR NBI system were developed and successfully tested for long-pulse operation of up to 300s. Several broad beam ion sources for industrial applications such as ion implantation and surface treatment were also developed by using arc, rf, and microwave discharges. Recently, ion source applications become diversified to the area of nano- and biotechnologies. For example, C60 ion source was developed for the use of bioapplications in nanometer scale. For focused ion beam as a nanofabrication tool, liquid metal ion sources were improved and a novel plasma ion source was developed by utilizing localized sheath discharges. Research and development activities of these ion sources will be discussed with short description of appropriate applications.