Abstract
More than 40 elements were implanted into PMMA/polymethyl methacrylate/Lucite/AZ111, polypyromellitimide/polyimide/Kapton, and epoxy, at energies up to 0.6 MeV and at fluences from 3×1013 to 1015 cm−2 and were depth profiled using secondary ion mass spectrometry (SIMS). SIMS depth profiling was performed for these combinations using both oxygen and cesium primary ions and positive and negative secondary ions, respectively. Implantation ranges and straggles were determined from the experimental profiles using a Pearson IV computer fitting program, and are compared with the corresponding results of TRIM 91, Lindhard, Scharff, Schio/tt theory, and Implant Sciences Profile Code calculations. The agreement among the three calculations and between the three calculations and the experimental results is discussed. The experimental error is about 25%.
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