Abstract
Ion implantation was examined as a pre-treatment procedure for AlN substrates used for direct bonding with Cu. It replaces the conventional process of thermal oxidation. Ti, Fe and O ions were used at acceleration voltages of 15 and 70 kV in the dose range between 10 16 and 10 18 ions/cm 2. Shear strength measurements of the prepared joints have shown that the optimum results are obtained for Ti implanted at 15 kV to a dose of 5×10 16 ions/cm 2. The bond strength attained for such conditions exceeds that of conventionally prepared joints by a factor of 5. The morphology of fractured joints was studied by SEM and discussed in terms of changes induced by the implanted ions.
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